An effective lithography training module adapting semianalytical calculation approaches

Cakmak A. O., ÇOLAK İ., Awadelkarim O. O.

JOURNAL OF THE SOCIETY FOR INFORMATION DISPLAY, cilt.29, sa.11, ss.868-895, 2021 (SCI-Expanded) identifier identifier

  • Yayın Türü: Makale / Tam Makale
  • Cilt numarası: 29 Sayı: 11
  • Basım Tarihi: 2021
  • Doi Numarası: 10.1002/jsid.1067
  • Dergi Adı: JOURNAL OF THE SOCIETY FOR INFORMATION DISPLAY
  • Derginin Tarandığı İndeksler: Science Citation Index Expanded (SCI-EXPANDED), Scopus, Academic Search Premier, Compendex, Computer & Applied Sciences, INSPEC
  • Sayfa Sayıları: ss.868-895
  • Anahtar Kelimeler: critical dimension, lithography, nanopatterning, parametric analysis, remote teaching, simulation, OPTICAL LITHOGRAPHY, RESOLUTION, NANOFABRICATION, LENS, OPC
  • Ankara Üniversitesi Adresli: Evet

Özet

A complete, self-sufficient package is prepared to teach the fundamental concepts of lithography. The adapted semianalytical approaches promise to illustratively create an ideal engaging environment for efficiently training next generation lithographers. The presented educational tool, which integrates the well-known modeling methods from the literature, is shown to capture the photolithography process step by step while offering the students a remote, hands-on feeling from introductory to graduate-level work. The importance of optical and chemistry related parameters are discussed with the aim of creating a useful laboratory assessment package for the educators to be easily integrated into their curriculum.