Evolution of the surface roughness (dynamic scaling) and microstructure of sputter-deposited Ag75Co25 granular films
JOURNAL OF PHYSICS-CONDENSED MATTER, vol.12, no.44, pp.9237-9245, 2000 (SCI-Expanded, Scopus)
- Publication Type: Article / Article
- Volume: 12 Issue: 44
- Publication Date: 2000
- Doi Number: 10.1088/0953-8984/12/44/306
- Journal Name: JOURNAL OF PHYSICS-CONDENSED MATTER
- Journal Indexes: Science Citation Index Expanded (SCI-EXPANDED), Scopus
- Page Numbers: pp.9237-9245
- Ankara University Affiliated: No
Abstract
X-ray specular-reflectivity measurements have been carried out on Ag75Co25 granular films which were sputter-deposited on Si substrates with SiO2 surface, to investigate the evolution of surface roughness as a function of film thickness. X-ray reflectivity data were recorded for thicknesses of Ag75Co25 thin films ranging from 8.8-116.9 nm. A power law behaviour of the interfacial width of a growing interface in sputtered-deposited Ag75Co25 granular films was observed. The scaling exponent was found to be beta = 0.43 +/- 0.01 and compared with theoretical calculations. High resolution electron microscopy revealed the presence of crystalline particles of fee Ag and hcp Co. The structural and magnetoresistive properties of the films are discussed.