Current flow mechanism in Cu2O/p-Si heterojunction prepared by chemical method
JOURNAL OF PHYSICS D-APPLIED PHYSICS, cilt.42, sa.22, 2009 (SCI-Expanded, Scopus)
- Yayın Türü: Makale / Tam Makale
- Cilt numarası: 42 Sayı: 22
- Basım Tarihi: 2009
- Doi Numarası: 10.1088/0022-3727/42/22/225108
- Dergi Adı: JOURNAL OF PHYSICS D-APPLIED PHYSICS
- Derginin Tarandığı İndeksler: Science Citation Index Expanded (SCI-EXPANDED), Scopus
- Ankara Üniversitesi Adresli: Evet
Özet
Cu2O thin films were chemically deposited on single-crystal p-Si substrates to form Cu2O/p-Si heterojunctions. The structure of the Cu2O films was analysed by x-ray diffraction spectroscopy and UV-Vis-NIR transmittance spectra. In order to investigate the dark current transport mechanism in Cu2O/p-Si heterojunctions the current-voltage characteristics were measured in the temperature range 120-320K and capacitance-voltage characteristics at a high frequency of similar to 1MHz at room temperature. The I-V-T characteristics revealed that the forward current was determined by trap-assisted multi-step tunnelling. The activation energy determined from the saturation current and the junction built-in potential determined from the capacitance-voltage characteristics were about 0.18 eV and 1.10V at room temperature, respectively.