Influence of oxygen flow rate in CuO
APPLIED SURFACE SCIENCE, cilt.352, ss.155-157, 2015 (SCI-Expanded, Scopus)
- Yayın Türü: Makale / Tam Makale
- Cilt numarası: 352
- Basım Tarihi: 2015
- Doi Numarası: 10.1016/j.apsusc.2015.01.095
- Dergi Adı: APPLIED SURFACE SCIENCE
- Derginin Tarandığı İndeksler: Science Citation Index Expanded (SCI-EXPANDED), Scopus
- Sayfa Sayıları: ss.155-157
- Anahtar Kelimeler: DC magnetron sputtering method, CuO, Oxygen flow rate, OXIDE THIN-FILMS, COPPER-OXIDE, GROWTH
- Ankara Üniversitesi Adresli: Evet
Özet
The structural, optical and electrical properties of cupric oxide (CuO) films coated by DC magnetron sputtering method under different oxygen flow rate (0%, 35%, 70%) were examined. The electrical transport mechanism of the films was also investigated in a temperature range of 110-400 K. Electrical conductivity of the films mainly affected by oxygen flow rate since density of states (DOS) was critically dependent on the oxygen flow rate. Considering oxygen flow rate, a direct link between the DOS and electrical properties of the films was established. (C) 2015 Elsevier B.V. All rights reserved.