Influence of oxygen flow rate in CuO

Serin T., GÜRAKAR S., Ot H., YILDIZ A., Serin N.

APPLIED SURFACE SCIENCE, cilt.352, ss.155-157, 2015 (SCI-Expanded) identifier identifier

  • Yayın Türü: Makale / Tam Makale
  • Cilt numarası: 352
  • Basım Tarihi: 2015
  • Doi Numarası: 10.1016/j.apsusc.2015.01.095
  • Dergi Adı: APPLIED SURFACE SCIENCE
  • Derginin Tarandığı İndeksler: Science Citation Index Expanded (SCI-EXPANDED), Scopus
  • Sayfa Sayıları: ss.155-157
  • Anahtar Kelimeler: DC magnetron sputtering method, CuO, Oxygen flow rate, OXIDE THIN-FILMS, COPPER-OXIDE, GROWTH
  • Ankara Üniversitesi Adresli: Evet

Özet

The structural, optical and electrical properties of cupric oxide (CuO) films coated by DC magnetron sputtering method under different oxygen flow rate (0%, 35%, 70%) were examined. The electrical transport mechanism of the films was also investigated in a temperature range of 110-400 K. Electrical conductivity of the films mainly affected by oxygen flow rate since density of states (DOS) was critically dependent on the oxygen flow rate. Considering oxygen flow rate, a direct link between the DOS and electrical properties of the films was established. (C) 2015 Elsevier B.V. All rights reserved.